Brewer Science Innovation Expands Lithography Limits with New Advanced Materials

Brewer Science continues to push the limits of patterning technology with new innovative solutions in 2013. Building on its strong expertise in material design, Brewer Science continues to deliver more versatile lithography technologies. The new generations of ARC and OptiStack materials have set the industry standard for advanced lithography.

Last year, the company successfully commercialized multiple OptiStack materials for negative-tone development (NTD) while making significant developments in OptiStack material platforms for extreme ultraviolet (EUV) and directed self-assembly (DSA) patterning. These advances in the OptiStack material platforms, along with techniques for improving defectivity and pattern transfer performance, will be presented at SPIE Advanced Lithography 2013 in San Jose, Feb. 24-28. With this work, Brewer Science continues to fulfill its commitment to the industry by furthering Moore’s Law through materials solutions.

“Looking to the future we will continue to innovate, work closely with customers and vendors, and push technology boundaries,” said Dr. Terry Brewer, founder and CEO of Brewer Science. “Innovation is what the industry needs to make the big technology jumps required for the future, and Brewer Science is positioned to continue to play that important role in the supply chain. The successful products we have delivered through the years have been a result of the company’s commitment to innovation, which will only increase.”